Hydro Pneo Vac Technologies

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Hydro Pneo Vac Technologies (HPVT) RF & DC Sputtering is a widely used and highly versatile vacuum coating system used for the deposition of a variety of coating materials.  Sputtering deposition systems use high energy particles as a way of transferring kinetic energy to a target in order to remove material for deposition.  For sputtering, the energized particles are present as a glow diffuse plasma.  A plasma is a partially ionized gas consisting of positively charged particles (cations), negatively charged particles (electrons and anions), and neutrals.  The overall charge of a plasma is neutral.  In a plasma, the ionization of the gas generally occurs between a cathode and an anode.  In sputtering systems the cathode, which is the electron emitter, is the target material.  The anode, which is the electron receiver, is usually the vacuum chamber wall or the substrate (component to be coated).